Invalidity dossier

US 9786510

Fin-shaped structure and manufacturing method thereof

Current assignee: Taiwan Semiconductor Manufacturing Company Ltd.

Added 5/14/2026, 12:00:47 AM

Active provider: Google · gemini-2.5-flash

Auto-generating section 1 of 1: Derivative works

Each section takes ~30-60s with web-search grounding. Keep this tab open — sections will fill in below as they complete.

Patent summary

Title, assignee, inventors, filing/issue dates, abstract, and a plain-language overview of the claims.

✓ Generated

Here is a concise summary of US patent 9786510:

US Patent 9786510 Summary

  • Title: Fin-shaped structure and manufacturing method thereof
  • Current Assignee: Marlin Semiconductor Ltd
  • Inventors: Wen-Jiun Shen, Ssu-I Fu, Yen-Liang Wu, Chia-Jong Liu, Yu-Hsiang Hung, Chung-Fu Chang, Man-Ling Lu, Yi-Wei Chen
  • Filing Date: 2014-10-13
  • Issue Date: 2017-10-10
  • Abstract: The patent describes a fin-shaped structure that includes a substrate with a first fin-shaped structure in one area and a second fin-shaped structure in another area, where the second structure has a ladder-shaped cross-sectional profile. The invention also covers two methods for manufacturing this structure. One method involves modifying an external surface of the top of the second fin-shaped structure to form a modified part, then removing this modified part using a highly selective removal process to create the ladder-shaped profile.

Plain-Language Overview of Independent Claims:

  • Claim 1: This claim describes a specific fin-shaped structure on a semiconductor substrate. It involves two types of fin arrangements: "first fin-shaped structures" and "second fin-shaped structures," each comprising at least two individual fins (first/second fin and third/fourth fin, respectively). The key distinction is in the spacing: the distance between the top corners of adjacent fins in the "first fin-shaped structures" is less than the distance between the top corners of adjacent fins in the "second fin-shaped structures." Crucially, the distance between the lower parts of adjacent fins is the same for both the first and second fin-shaped structures. This configuration means the second fin-shaped structures effectively have a wider top portion or a "ladder-shaped" profile compared to the first fin-shaped structures, while their bases maintain the same spacing. The top corners mentioned are directly opposite each other.

USPTO and CAFC 2026 Dockets:

A search for US patent 9786510 in the USPTO database indicates the patent is "Active" and expires on 2035-01-24. The patent information also notes that the "Family has litigation" and specifically mentions a "PTAB case IPR2025-01484 filed (Not Instituted - Procedural)".

As of April 26, 2026, a direct search of CAFC 2026 dockets for patent number 9786510 did not yield any specific case filings for 2026. While an Inter Partes Review (IPR) case (IPR2025-01484) was filed at the Patent Trial and Appeal Board (PTAB) in 2025, it was "Not Instituted - Procedural." This status suggests the case did not proceed to a full review, and therefore, it is unlikely to have led to an appeal at the CAFC in 2026.

Generated 5/23/2026, 6:45:36 AM