US 12347711

To: Management
From: Senior Patent Analyst
Date: 2026-04-26
Subject: Analysis of U.S. Patent No. 12347711

Patent Summary

A search of the USPTO database confirms the details for US patent 12347711. A search of the CAFC (United States Court of Appeals for the Federal Circuit) 2026 dockets for litigation involving this patent number yielded no results as of today's date.

• Title: Gas diffusion device, and wafer container including the same
• Assignee: Gudeng Precision Industrial Co Ltd
• Inventors: Ming-Chien Chiu, Chia-Ho CHUANG, Kuo-Hua Lee, Shu-Hung Lin, Hao-Kang Hsia
• Filing Date: August 8, 2022
• Issue Date: July 1, 2025
• Abstract: The present invention provides a wafer container and a gas diffusion device applied in the wafer container. The wafer container includes a shell, and all components included and applied on the shell are made of thermal resistance materials. The gas diffusion device and the wafer container, when assembled together, utilize a coupling structure and a collar as a protection mechanism for the gas diffusion device. The gas diffusion device has a buffering chamber that provides a buffering tolerance and a communicating space for the gas before the gas enters an interior space of the wafer container.
  (Source: https://patents.google.com/patent/[US12347711](/patent/US12347711)/en)

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Overview of Independent Claims

The patent contains one independent claim based on the provided text.

Claim 1: Plain-Language Overview

Claim 1 describes a specific design for a gas diffusion system used inside a semiconductor wafer container. The primary purpose of such a system is to purge the container with a dry, inert gas to protect the wafers from moisture and contaminants.

The core of the invention is a system that ensures a direct, straight-through path for the gas. It consists of three main parts:

1. A Buffering Gas Chamber: This is a small chamber located at the bottom of the wafer container. Before the gas enters the main container space, it first flows into this buffering chamber, which helps to stabilize the gas pressure.
2. A Coupling Structure: This is a nozzle-like port on the bottom of the container that connects the buffering chamber to the inside of the container.
3. A Porous Tube: This is a vertical "gas tower" that mounts directly onto the coupling structure inside the container. Gas flows up this tube and diffuses out through its porous walls to spread evenly among the wafers.

The key inventive feature specified in this claim is that the center axis of the incoming gas supply must be perfectly aligned (i.e., "coaxial") with the center axis of the coupling structure. This creates a straight, unimpeded path for the gas, which is intended to improve purging efficiency and reduce turbulence compared to prior art designs that used offset, winding gas paths.
(Source: US Patent 12347711, Claim 1)