Prior art

Here is an analysis of the most relevant prior art for US patent 7851394, based on the citations within the patent text and supplementary search for dates and full citations:

Prior Art References for US7851394

The following U.S. Patents and Patent Application were cited within the description of US7851394 as prior art.

1. U.S. Pat. No. 5,374,595

• Full Citation: U.S. Pat. No. 5,374,595, "Transparent high-strength glass compositions," to Dumbaugh, Jr., William H. et al.
• Publication/Filing Date: Granted: December 20, 1994. Filed: June 1, 1993.
• Brief Description: This patent discloses glass compositions with strain points exceeding 650° C., which exhibit acceptable thermal stability for active plates in flat panel display devices (AMLCDs) when subjected to the thermal history of the fusion process. These glasses are suitable for use with a-Si and super low-temperature p-Si thin film transistors (TFTs).
• Potentially Anticipated Claim(s): This reference potentially anticipates elements of claims 7(b) and 11(b) of US7851394, which require a strain point greater than or equal to 650° C.

2. U.S. Pat. No. 6,319,867

• Full Citation: U.S. Pat. No. 6,319,867, "Glasses for flat panel displays," to Chacon, Lisa C. et al.
• Publication/Filing Date: Granted: November 20, 2001. Filed: November 30, 1998.
• Brief Description: This patent describes alkali-free, aluminosilicate glasses with desirable physical and chemical properties for flat panel display substrates. It particularly notes glasses with densities less than 2.45 g/cm³ and a liquidus viscosity greater than about 200,000 poises, and strain points exceeding 650° C., providing thermal stability for TFT applications.
• Potentially Anticipated Claim(s): This reference potentially anticipates elements of claims 7(b) and 11(b) (strain point ≥ 650° C.), and claims 7(a) and 11(a) (liquidus viscosity ≥ 100,000 poise). It also provides general background for the alkali-free glass compositions for display substrates in claims 1, 5, and 8, and the density requirement in claims 1(c), 6, and 10.

3. U.S. Pat. No. 3,338,696

• Full Citation: U.S. Pat. No. 3,338,696, "Sheet forming apparatus," to Dockerty, Stuart M.
• Publication/Filing Date: Granted: August 29, 1967. Filed: May 6, 1964.
• Brief Description: This patent describes a downdraw sheet drawing process, specifically a fusion process, for producing thermoplastic sheet material, particularly glass sheets, with fire-polished surface quality and uniform thickness without requiring post-forming finishing. It focuses on the apparatus design for such a process.
• Potentially Anticipated Claim(s): While US7851394's claims 1-16 are directed to glass compositions, the invention's summary also describes "a method for producing alkali-free glass sheets by a downdraw process (e.g., a fusion process)." This patent is fundamental prior art for the fusion manufacturing process mentioned in the context of the invention.

4. U.S. Pat. No. 3,682,609

• Full Citation: U.S. Pat. No. 3,682,609, "Controlling thickness of newly drawn glass sheet," to Dockerty, Stuart M.
• Publication/Filing Date: Granted: August 8, 1972. Filed: October 6, 1969.
• Brief Description: This patent, also by Dockerty, details an improved system for precisely controlling the temperature profile across the width of newly formed sheet glass, addressing issues of objectionable thickness variations. It is also cited in US7851394 as describing the downdraw (fusion) process.
• Potentially Anticipated Claim(s): Similar to U.S. Pat. No. 3,338,696, this patent serves as foundational prior art for the downdraw (fusion) glass manufacturing process.

5. U.S. Pat. No. 5,785,726

• Full Citation: U.S. Pat. No. 5,785,726, "Method of making flat panel display glass substrates free of arsenic," to Dorfeld, Claus et al.
• Publication/Filing Date: Granted: July 28, 1998. Filed: October 3, 1996.
• Brief Description: This patent describes processes specifically for manufacturing arsenic-free glasses. The explicit aim is to address environmental and health issues associated with arsenic fining.
• Potentially Anticipated Claim(s): This reference potentially anticipates compositional limitations in claims 3, 12(a), and 16 of US7851394, which require the glass to comprise at most 0.05 mole percent As₂O₃.

6. U.S. Pat. No. 6,128,924

• Full Citation: U.S. Pat. No. 6,128,924, "Method for the fining of glass, especially glass for flat panel displays," to Bange, Peter et al.
• Publication/Filing Date: Granted: October 3, 2000. Filed: April 12, 1999.
• Brief Description: This patent discloses processes for manufacturing arsenic-free glasses, providing alternative fining methods.
• Potentially Anticipated Claim(s): This reference potentially anticipates compositional limitations in claims 3, 12(a), and 16 of US7851394, relating to the arsenic concentration (at most 0.05 mole percent As₂O₃).

7. U.S. Pat. No. 5,824,127

• Full Citation: U.S. Pat. No. 5,824,127, "Method for the fining of glass, especially glass for flat panel displays," to Bange, Peter et al.
• Publication/Filing Date: Granted: October 20, 1998. Filed: May 13, 1997.
• Brief Description: This patent also describes processes for manufacturing arsenic-free glasses.
• Potentially Anticipated Claim(s): This reference potentially anticipates compositional limitations in claims 3, 12(a), and 16 of US7851394, concerning the arsenic concentration (at most 0.05 mole percent As₂O₃).

8. U.S. Patent Application Publication No. 2006/0242987

• Full Citation: U.S. Patent Application Publication No. 2006/0242987, "Alkali-free, boroalumino silicate glass for flat panel display applications," to Ellison, Adam J. G. et al.
• Publication/Filing Date: Publication Date: November 2, 2006. Filing Date: April 28, 2005.
• Brief Description: Cited as a "co-pending patent application Ser. No. 11/116,669", it discloses processes for manufacturing arsenic-free glasses.
• Potentially Anticipated Claim(s): This reference potentially anticipates compositional limitations in claims 3, 12(a), and 16 of US7851394, concerning the arsenic concentration (at most 0.05 mole percent As₂O₃).